US20070263472A1 - Process environment variation evaluation - Google Patents
Process environment variation evaluation Download PDFInfo
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- US20070263472A1 US20070263472A1 US11/382,722 US38272206A US2007263472A1 US 20070263472 A1 US20070263472 A1 US 20070263472A1 US 38272206 A US38272206 A US 38272206A US 2007263472 A1 US2007263472 A1 US 2007263472A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
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Definitions
- the invention relates generally to microelectronics fabrication, and more particularly, to structures and methods for evaluating the effect of process environment variations across a chip.
- Vt threshold voltage
- FETs field effect transistors
- a pattern density of various material stacks can modulate the rapid thermal anneal (RTA) temperature locally and may cause as much as 100 mV variation in threshold voltage (Vt) within a chip.
- RTA rapid thermal anneal
- Vt threshold voltage
- One approach to this problem is to measure an electrical property of two transistors and then to characterize across chip variation based on those measurements. This approach, however, can require a very large sample size of transistors to provide adequate data for variations over many length scales. For example, the characterization does not enable an evaluation of a direction of the process environment variation on the chip.
- a structure and related method are disclosed including a plurality of electrical structures arranged in a non-collinear fashion for determining a magnitude and direction of a process environment variation in the vicinity of the plurality of electrical structures.
- the plurality of structures may include a first polarity FET coupled to a second polarity FET, each of the first polarity FET and the second polarity FET are coupled to a first pad and a second pad such that the structure allows independent measurement of the first polarity FET and the second polarity FET using only the first and second pads.
- the electrical structures may include resistors, diodes or ring oscillators. Appropriate measurements of each electrical structure allow a gradient field including a magnitude and direction of the effect of a process environment variation to be determined.
- a first aspect of the invention provides a structure comprising: a plurality of electrical structures arranged in a non-collinear fashion for determining a magnitude and direction of a process environment variation in a vicinity of the plurality of electrical structures.
- a second aspect of the invention provides a structure comprising: a first polarity field effect transistor (FET) coupled to a second polarity FET, each of the first polarity FET and the second polarity FET coupled to a first pad and a second pad; and wherein the structure provides for independent measurement of the first polarity FET and the second polarity FET using only the first pad and the second pad.
- FET field effect transistor
- a third aspect of the invention provides a method of determining a gradient field of a process environment variation, the method comprising: providing a plurality of electrical structures arranged in a non-collinear fashion in a substrate; performing a process on the substrate; measuring an electrical property of each of the electrical structures; and determining a magnitude and a direction of the process environment variation in the vicinity of the plurality of electrical structures based on the measurements.
- a fourth aspect of the invention provides a method of independently evaluating transistors, the method comprising: forming a first polarity field effect transistor (FET) coupled to a second polarity FET, each of the first polarity FET and the second polarity FET coupled to a first pad and a second pad; and independently measuring the first polarity FET and the second polarity FET using only the first pad and the second pad.
- FET field effect transistor
- FIG. 1 shows one embodiment of a structure for evaluating process environment variation according the invention.
- FIG. 2A shows a first embodiment of an electrical structure used in the structure of FIG. 1 including resistors.
- FIG. 2B shows a second embodiment of an electrical structure used in the structure of FIG. 1 including diodes.
- FIG. 2C shows a third embodiment of an electrical structure used in the structure of FIG. 1 including ring oscillators.
- FIG. 3 shows a fourth embodiment of an electrical structure used in the structure of FIG. 1 including transistors.
- FIG. 4 shows the fourth embodiment of the electrical structure of FIG. 3 implemented in the layout of FIGS. 2A-2B .
- FIG. 5 shows an alternative fourth embodiment of an electrical structure used in the structure of FIG. 1 including transistors.
- FIG. 6 shows the alternative fourth embodiment of the electrical structure of FIG. 5 implemented in the layout of FIG. 2A -B.
- FIG. 1 shows one embodiment of a structure 100 for evaluating the effect of a process environment variation across a chip 102 .
- Structure 100 includes a plurality of electrical structures 104 arranged in a non-collinear fashion for determining a magnitude and a direction of a process environment variation in the vicinity of plurality of electrical structures 104 .
- the process environment variation may include practically any environmental characteristic that varies during a particular fabrication process, e.g., etching, annealing, material deposition, ion implanting, etc.
- a process environment variation may include a spacer etch variation, a photolithography exposure variation, a gate length variation, a variation in film deposition, and an anneal temperature gradient.
- Electrical structures 104 A-C are interconnected, via interconnects 110 , to a plurality of probe pads (or simply “pads”) 106 . As illustrated, electrical structures 104 A-C are interconnected by four pads 106 A-D, but more may be employed where more electrical structures 104 are used.
- Electrical structures 104 may take the form of a variety of different electrical devices.
- electrical structures may each include a resistor, a diode or a ring oscillator.
- each end (input or output) of the aforementioned devices are coupled as indicated in FIG. 1 .
- FIG. 2A shows one embodiment employing doped polysilicon resistors 120 A-C.
- resistors 122 A-C are interconnected to pads 106 A-D.
- FIG. 2B shows another embodiment employing diodes 122 A- 122 C.
- diodes 120 A-C are interconnected to pads 106 A-D.
- FIG. 2C shows another embodiment employing ring oscillators 124 A-C.
- ring oscillators 124 A-C are interconnected to pads 106 A-D, and output signals of each ring oscillator 124 A-C are connected to a signal probe pad 126 .
- each electrical structure 104 may include a plurality of transistors. In FIGS. 3 and 5 , two transistors 130 A-B are shown, respectively. However, it is understood that any number of transistors 130 A-B greater than or equal to two may be used.
- each electrical structure 104 may include a first polarity field effect transistor (FET), e.g., a NFET 130 A, 230 A, coupled to a second polarity FET, e.g., a PFET 130 B, 230 B. It is understood that the position of each type FET may be switched from what is illustrated.
- FET first polarity field effect transistor
- first polarity FET 130 A, 230 A and second polarity FET 130 B, 230 B are each coupled to a first pad 206 A, 306 A and a second pad 206 B, 2306 B.
- first polarity FET 130 A, 230 A and second polarity FET 130 B, 230 B are each coupled to a first pad 206 A, 306 A and a second pad 206 B, 2306 B.
- independent measurement of first polarity FET 130 A, 230 A and second polarity FET 130 B, 230 B using only first pad 206 A, 306 A and second pad 206 B, 306 B is made possible.
- the electrical property measured may be varied depending on the particular structure provided.
- each electrical structure 104 employs measurement of a threshold voltage (Vt).
- FIG. 4 shows the transistor embodiment of electrical structure 104 of FIG. 3 implemented in the layout of FIGS. 2 A-B. Referring to FIGS. 3 and 4 , to measure NFET 130 A Vt, positive voltage is supplied to pad 206 A to which the gates are connected with reference to ground on pad 206 B.
- the voltage applied is adjusted until the current drawn achieves a preset condition defining threshold voltage (typically 40 to 400 nA times the width of the FET and divided by the length of the FET).
- PFET 130 B Vt can be measured by providing negative voltage to pad 206 A to which the gates are connected with reference to ground on pad 206 B.
- the voltage applied is adjusted until the current drawn achieves a preset condition defining threshold voltage (typically 40 to 400 nA times the width of the FET and divided by the length of the FET).
- a source 244 A of a first polarity FET 230 A (e.g., an NFET) is coupled to first pad 306 A
- a gate 240 A and a drain 242 A of first polarity FET 230 A are coupled to a source 244 B of second polarity FET 230 B (e.g., a PFET)
- a gate 240 B and a drain 242 B of second polarity FET 230 B are coupled to a second pad 306 B.
- electrical structure 104 measures an off current (I off ).
- FIG. 6 shows the transistor embodiment of electrical structure 104 of FIG. 5 implemented in the layout of FIGS. 2 A-B. Referring to FIGS. 5 and 6 , the off-current of NFET 230 A is measured by providing a positive voltage (greater than Vt) on pad 306 A to which only a drain is electrically connected to ground on pad 306 B.
- the current measured in this state is the off-current (Ioff) of NFET 230 A.
- the off-current of PFET 230 B is obtained by providing a negative voltage (greater than Vt) on pad 306 A to which only a drain is electrically connected to ground on pad 306 B.
- the current measured in this state is off-current (Ioff) of PFET 230 B.
- each electrical structure 104 is substantially identical in design to the others used therewith to provide accurate gradient measurements. However, some variation may be allowed in some cases.
- the above-described structure 100 may be employed to measure the effect of a process environment variation across a chip 102 ( FIG. 1 ).
- one of the above-described embodiments of electrical structures 104 is provided. That is, a plurality of electrical structures 104 are arranged in a non-collinear fashion in a substrate 150 ( FIG. 1 ) used to fabricate a chip 102 .
- a process is performed on substrate 102 .
- the process may include any now known or later developed semiconductor fabrication process, e.g., an etch, an anneal, material deposition, ion implanting, etc.
- An electrical property e.g., threshold voltage (Vt), resistance (R), off current (Ioff), etc.
- the particular type of electrical property measured varies depending on the type of electrical structure 104 used. For example, resistance is measured if resistors are used, threshold voltage (Vt) or off current (Ioff) is measured if transistors are used, a reverse bias leakage or forward bias voltage may be measured if diodes are used, and a speed or delay using fixed voltages may be measured if ring oscillators are used.
- a magnitude and a direction of the process environment variation in the vicinity of the plurality of electrical structures 104 can be determined.
- electrical structures 104 shown in FIG. 1 are transistor structures as shown in FIG. 3
- electrical structure 104 A having a higher threshold voltage (Vt) compared to electrical structures 104 B, 104 C may indicate a pattern density of various material stacks at the location, i.e., X1, Y1, of electrical structure 104 A has altered the rapid thermal anneal (RTA) temperature locally.
- RTA rapid thermal anneal
- electrical structures 104 may include doped polysilicon resistors, which are sensitive to annealing temperatures.
- resistance measurements can be used to determine the anneal temperature at the location of each electrical structure 104 (e.g., using empirical data) or the effect of the annealing at the location of each electrical structure 104 .
- the non-collinear location of electrical structures 104 allows an evaluation in two dimensions, i.e., based on location, such that a direction of the effect can be determined.
- the local magnitude and direction of change can be calculated from the data obtained from the three structures 104 as follows. Let Z 1 , Z 2 , and Z 3 represent the electrical measurements obtained from structures 104 A, 104 B, and 104 C, respectively.
- dZ/dY [( X 2 ⁇ X 1)( Z 3 ⁇ Z 1) ⁇ ( Z 2 ⁇ Z 1)( X 3 ⁇ X 1)]/[( X 2 ⁇ X 1)( Y 3 ⁇ Y 1) ⁇ ( Y 2 ⁇ Y 1)( X 3 ⁇ X 1)] (Eq. 1)
- dZ/dY [( Y 3 ⁇ Y 1)( Z 2 ⁇ Z 1) ⁇ ( Z 3 ⁇ Z 1)( Y 2 ⁇ Y 1)]/[( X 2 ⁇ X 1)( Y 3 ⁇ Y 1) ⁇ ( Y 2 ⁇ Y 1)( X 3 ⁇ X 1)] (Eq. 2).
- a method of independently evaluating transistors may be employed using the structure of FIG. 3 or 5 alone, or as part of the above-described embodiment for evaluating the effect of a process environment variation.
- the structure used can be selected from any of the above-described versions of the transistor embodiment, i.e., FIGS. 3 and 5 .
- first polarity FET 130 A is coupled to second polarity FET 130 B with each first polarity FET 130 A and second polarity FET 130 B coupled to first pad 206 A and second pad 206 B.
- transistors 130 A, 130 B are provided, various processes are performed on first polarity FET 130 A and second polarity FET 130 B.
- first polarity FET 130 A and second polarity FET 130 B using only first pad 206 A and second pad 206 B may then occur to evaluate transistors 130 A, 130 B and, hence, the processes used to create them.
- the type of electrical property measured will vary depending the structure used. For example, referring to FIG. 3 , the measuring may include: applying a positive voltage ramp to one pad 206 A with respect to the other pad 206 B to maintain PFET 130 B in an off-state and measuring NFET 130 A, i.e., measuring a threshold voltage thereof.
- a negative voltage ramp may be applied to pad 206 B with respect to the other pad 206 A to maintain NFET 130 A in an off-state and measure PFET 130 B, i.e., measuring a threshold voltage thereof.
- One example may include: applying a positive ramp on pad 206 B with an ammeter to ground on the other pad 206 A. This situation will turn NFET 130 A on when the threshold voltage (Vt) is reached, while PFET 130 B remains off. Hence, the situation will force a positive current, e.g., approximately 300 nA ⁇ W/L, resulting in the value of the threshold voltage (Vt) of NFET 130 A to be communicated from pad 206 B to pad 206 A.
- CMOS complementary metal-oxide semiconductors
- bodies may continue to be left to ‘float’ or, the bodies may be explicitly connected in a number of ways.
- One such connection is illustrated in FIG. 3 with dashed lines connecting bodies 146 A, 146 B to sources 144 .
- bodies 146 A, 146 B can be wired to other probe pads.
Abstract
Structures and methods are disclosed for evaluating the effect of a process environment variation. A structure and related method are disclosed including a plurality of electrical structures arranged in a non-collinear fashion for determining a magnitude and direction of a process environment variation in the vicinity of the plurality of electrical structures. The plurality of structures may include a first polarity FET coupled to a second polarity FET, each of the first polarity FET and the second polarity FET are coupled to a first pad and a second pad such that the structure allows independent measurement of the first polarity FET and the second polarity FET using only the first and second pads. Alternatively, the electrical structures may include resistors, diodes or ring oscillators. Appropriate measurements of each electrical structure allow a gradient field including a magnitude and direction of the effect of a process environment variation to be determined.
Description
- 1. Technical Field
- The invention relates generally to microelectronics fabrication, and more particularly, to structures and methods for evaluating the effect of process environment variations across a chip.
- 2. Background Art
- In the microelectronic fabrication industry, there is often a need to evaluate the effect of process environment variations on a chip and, in particular, across a chip. For example, oftentimes data pertaining to electrical properties of threshold voltage (Vt) of field effect transistors (FETs) based on variations in a process is required. More specifically, it may be required to evaluate the variation of PFET and NFET threshold voltage with respect to process environment variations experienced during fabrication. Threshold voltage (Vt) may vary within a chip, for example, due to variations in gate length caused by reactive ion etching (RIE) load variation or photoresist planarization variations. In another example, a pattern density of various material stacks can modulate the rapid thermal anneal (RTA) temperature locally and may cause as much as 100 mV variation in threshold voltage (Vt) within a chip. One approach to this problem is to measure an electrical property of two transistors and then to characterize across chip variation based on those measurements. This approach, however, can require a very large sample size of transistors to provide adequate data for variations over many length scales. For example, the characterization does not enable an evaluation of a direction of the process environment variation on the chip. Currently, there is no mechanism available for accurately determining a magnitude and a direction of the effect of a process environment variation across a chip.
- Structures and methods are disclosed for evaluating the effect of a process environment variation. A structure and related method are disclosed including a plurality of electrical structures arranged in a non-collinear fashion for determining a magnitude and direction of a process environment variation in the vicinity of the plurality of electrical structures. The plurality of structures may include a first polarity FET coupled to a second polarity FET, each of the first polarity FET and the second polarity FET are coupled to a first pad and a second pad such that the structure allows independent measurement of the first polarity FET and the second polarity FET using only the first and second pads. Alternatively, the electrical structures may include resistors, diodes or ring oscillators. Appropriate measurements of each electrical structure allow a gradient field including a magnitude and direction of the effect of a process environment variation to be determined.
- A first aspect of the invention provides a structure comprising: a plurality of electrical structures arranged in a non-collinear fashion for determining a magnitude and direction of a process environment variation in a vicinity of the plurality of electrical structures.
- A second aspect of the invention provides a structure comprising: a first polarity field effect transistor (FET) coupled to a second polarity FET, each of the first polarity FET and the second polarity FET coupled to a first pad and a second pad; and wherein the structure provides for independent measurement of the first polarity FET and the second polarity FET using only the first pad and the second pad.
- A third aspect of the invention provides a method of determining a gradient field of a process environment variation, the method comprising: providing a plurality of electrical structures arranged in a non-collinear fashion in a substrate; performing a process on the substrate; measuring an electrical property of each of the electrical structures; and determining a magnitude and a direction of the process environment variation in the vicinity of the plurality of electrical structures based on the measurements.
- A fourth aspect of the invention provides a method of independently evaluating transistors, the method comprising: forming a first polarity field effect transistor (FET) coupled to a second polarity FET, each of the first polarity FET and the second polarity FET coupled to a first pad and a second pad; and independently measuring the first polarity FET and the second polarity FET using only the first pad and the second pad.
- The illustrative aspects of the present invention are designed to solve the problems herein described and/or other problems not discussed.
- These and other features of this invention will be more readily understood from the following detailed description of the various aspects of the invention taken in conjunction with the accompanying drawings that depict various embodiments of the invention, in which:
-
FIG. 1 shows one embodiment of a structure for evaluating process environment variation according the invention. -
FIG. 2A shows a first embodiment of an electrical structure used in the structure ofFIG. 1 including resistors. -
FIG. 2B shows a second embodiment of an electrical structure used in the structure ofFIG. 1 including diodes. -
FIG. 2C shows a third embodiment of an electrical structure used in the structure ofFIG. 1 including ring oscillators. -
FIG. 3 shows a fourth embodiment of an electrical structure used in the structure ofFIG. 1 including transistors. -
FIG. 4 shows the fourth embodiment of the electrical structure ofFIG. 3 implemented in the layout ofFIGS. 2A-2B . -
FIG. 5 shows an alternative fourth embodiment of an electrical structure used in the structure ofFIG. 1 including transistors. -
FIG. 6 shows the alternative fourth embodiment of the electrical structure ofFIG. 5 implemented in the layout ofFIG. 2A -B. - It is noted that the drawings of the invention are not to scale. The drawings are intended to depict only typical aspects of the invention, and therefore should not be considered as limiting the scope of the invention. In the drawings, like numbering represents like elements between the drawings.
- Referring to the drawings,
FIG. 1 shows one embodiment of astructure 100 for evaluating the effect of a process environment variation across a chip 102.Structure 100 includes a plurality ofelectrical structures 104 arranged in a non-collinear fashion for determining a magnitude and a direction of a process environment variation in the vicinity of plurality ofelectrical structures 104. The process environment variation may include practically any environmental characteristic that varies during a particular fabrication process, e.g., etching, annealing, material deposition, ion implanting, etc. For example, a process environment variation may include a spacer etch variation, a photolithography exposure variation, a gate length variation, a variation in film deposition, and an anneal temperature gradient. While threeelectrical structures 104A-C are shown, it is understood that any number ofelectrical structures 104 greater than or equal to three may be used. Each electrical structure is positioned at an X-coordinate and a Y-coordinate within chip 102 such that the three (or more) structures are not collinear. As illustrated, onlyelectrical structures electrical structures 104A-C are used, this results in a substantially triangulated arrangement. The triangular arrangement does not need to be any particular type of triangle, e.g., isosceles, right, etc.Electrical structures 104A-C are interconnected, viainterconnects 110, to a plurality of probe pads (or simply “pads”) 106. As illustrated,electrical structures 104A-C are interconnected by fourpads 106A-D, but more may be employed where moreelectrical structures 104 are used. -
Electrical structures 104 may take the form of a variety of different electrical devices. In one embodiment, electrical structures may each include a resistor, a diode or a ring oscillator. In this case, each end (input or output) of the aforementioned devices are coupled as indicated inFIG. 1 .FIG. 2A shows one embodiment employing dopedpolysilicon resistors 120A-C. As illustrated, resistors 122A-C are interconnected topads 106A-D.FIG. 2B shows another embodiment employing diodes 122A-122C. As illustrated,diodes 120A-C are interconnected topads 106A-D.FIG. 2C shows another embodiment employingring oscillators 124A-C. As illustrated,ring oscillators 124A-C are interconnected topads 106A-D, and output signals of eachring oscillator 124A-C are connected to asignal probe pad 126. - Turning to
FIGS. 3 and 5 , in another embodiment, eachelectrical structure 104 may include a plurality of transistors. InFIGS. 3 and 5 , twotransistors 130A-B are shown, respectively. However, it is understood that any number oftransistors 130A-B greater than or equal to two may be used. In the transistor embodiment, eachelectrical structure 104 may include a first polarity field effect transistor (FET), e.g., aNFET PFET first polarity FET second polarity FET first pad second pad 206B, 2306B. With this structure, independent measurement offirst polarity FET second polarity FET first pad second pad - With specific reference to
FIG. 3 , in one version of the transistor embodiment ofelectrical structure 104,gates 140 and drains 142 offirst polarity FET 130A andsecond polarity FET 130B are coupled tofirst pad 206A, andsources 144 offirst polarity FET 130A andsecond polarity FET 130B are coupled tosecond pad 206B. In this case, eachelectrical structure 104 employs measurement of a threshold voltage (Vt).FIG. 4 shows the transistor embodiment ofelectrical structure 104 ofFIG. 3 implemented in the layout of FIGS. 2A-B. Referring toFIGS. 3 and 4 , to measureNFET 130A Vt, positive voltage is supplied to pad 206A to which the gates are connected with reference to ground onpad 206B. The voltage applied is adjusted until the current drawn achieves a preset condition defining threshold voltage (typically 40 to 400 nA times the width of the FET and divided by the length of the FET). Similarly,PFET 130B Vt can be measured by providing negative voltage to pad 206A to which the gates are connected with reference to ground onpad 206B. The voltage applied is adjusted until the current drawn achieves a preset condition defining threshold voltage (typically 40 to 400 nA times the width of the FET and divided by the length of the FET). - Turning to
FIG. 5 , in another version of the transistor embodiment ofelectrical structure 104, asource 244A of afirst polarity FET 230A (e.g., an NFET) is coupled tofirst pad 306A, agate 240A and adrain 242A offirst polarity FET 230A are coupled to asource 244B ofsecond polarity FET 230B (e.g., a PFET), and agate 240B and adrain 242B ofsecond polarity FET 230B are coupled to asecond pad 306B. In this case,electrical structure 104 measures an off current (Ioff). As an option in this case, abody 246A offirst polarity FET 230A is coupled tosource 244A offirst polarity FET 230A and abody 246B ofsecond polarity FET 230B is coupled tosource 244B ofsecond polarity FET 230B. Another option allows for eachbody FIG. 6 shows the transistor embodiment ofelectrical structure 104 ofFIG. 5 implemented in the layout of FIGS. 2A-B. Referring toFIGS. 5 and 6 , the off-current ofNFET 230A is measured by providing a positive voltage (greater than Vt) onpad 306A to which only a drain is electrically connected to ground onpad 306B. The current measured in this state is the off-current (Ioff) ofNFET 230A. The off-current ofPFET 230B is obtained by providing a negative voltage (greater than Vt) onpad 306A to which only a drain is electrically connected to ground onpad 306B. The current measured in this state is off-current (Ioff) ofPFET 230B. - It is understood that, in one embodiment, each
electrical structure 104 is substantially identical in design to the others used therewith to provide accurate gradient measurements. However, some variation may be allowed in some cases. - In one embodiment, the above-described structure 100 (
FIG. 1 ) may be employed to measure the effect of a process environment variation across a chip 102 (FIG. 1 ). In this case, one of the above-described embodiments ofelectrical structures 104 is provided. That is, a plurality ofelectrical structures 104 are arranged in a non-collinear fashion in a substrate 150 (FIG. 1 ) used to fabricate a chip 102. Next, a process is performed on substrate 102. The process may include any now known or later developed semiconductor fabrication process, e.g., an etch, an anneal, material deposition, ion implanting, etc. An electrical property, e.g., threshold voltage (Vt), resistance (R), off current (Ioff), etc., of each ofelectrical structures 104 is measured. The particular type of electrical property measured varies depending on the type ofelectrical structure 104 used. For example, resistance is measured if resistors are used, threshold voltage (Vt) or off current (Ioff) is measured if transistors are used, a reverse bias leakage or forward bias voltage may be measured if diodes are used, and a speed or delay using fixed voltages may be measured if ring oscillators are used. - Based on the measurements, a magnitude and a direction of the process environment variation in the vicinity of the plurality of
electrical structures 104 can be determined. For example, assumingelectrical structures 104 shown inFIG. 1 are transistor structures as shown inFIG. 3 ,electrical structure 104A having a higher threshold voltage (Vt) compared toelectrical structures electrical structure 104A has altered the rapid thermal anneal (RTA) temperature locally. In another example,electrical structures 104 may include doped polysilicon resistors, which are sensitive to annealing temperatures. In this case, resistance measurements can be used to determine the anneal temperature at the location of each electrical structure 104 (e.g., using empirical data) or the effect of the annealing at the location of eachelectrical structure 104. In any event, the non-collinear location ofelectrical structures 104 allows an evaluation in two dimensions, i.e., based on location, such that a direction of the effect can be determined. For example, the local magnitude and direction of change can be calculated from the data obtained from the threestructures 104 as follows. Let Z1, Z2, and Z3 represent the electrical measurements obtained fromstructures
dZ/dY=[(X2−X1)(Z3−Z1)−(Z2−Z1)(X3−X1)]/[(X2−X1)(Y3−Y1)−(Y2−Y1)(X3−X1)] (Eq. 1)
dZ/dY=[(Y3−Y1)(Z2−Z1)−(Z3−Z1)(Y2−Y1)]/[(X2−X1)(Y3−Y1)−(Y2−Y1)(X3−X1)] (Eq. 2). - In another embodiment, a method of independently evaluating transistors may be employed using the structure of
FIG. 3 or 5 alone, or as part of the above-described embodiment for evaluating the effect of a process environment variation. The structure used can be selected from any of the above-described versions of the transistor embodiment, i.e.,FIGS. 3 and 5 . In this case, as shown in, for example,FIG. 3 ,first polarity FET 130A is coupled tosecond polarity FET 130B with eachfirst polarity FET 130A andsecond polarity FET 130B coupled tofirst pad 206A andsecond pad 206B. Astransistors first polarity FET 130A andsecond polarity FET 130B. Independently measuringfirst polarity FET 130A andsecond polarity FET 130B using onlyfirst pad 206A andsecond pad 206B may then occur to evaluatetransistors FIG. 3 , the measuring may include: applying a positive voltage ramp to onepad 206A with respect to theother pad 206B to maintainPFET 130B in an off-state and measuringNFET 130A, i.e., measuring a threshold voltage thereof. Additionally, a negative voltage ramp may be applied to pad 206B with respect to theother pad 206A to maintainNFET 130A in an off-state and measurePFET 130B, i.e., measuring a threshold voltage thereof. One example may include: applying a positive ramp onpad 206B with an ammeter to ground on theother pad 206A. This situation will turnNFET 130A on when the threshold voltage (Vt) is reached, whilePFET 130B remains off. Hence, the situation will force a positive current, e.g., approximately 300 nA×W/L, resulting in the value of the threshold voltage (Vt) ofNFET 130A to be communicated frompad 206B to pad 206A. Similarly, if a negative current is forced intopad 206A of a value of, for example, approximately 70 nA×W/L, then the voltage frompad 206A to pad 206B will represent the threshold voltage (Vt) ofPFET 130B. If theFIG. 5 embodiment is employed, the same process may be implemented and the off current (Ioff) may be measured. - For semiconductor-on-insulator (SOI) FETs, the body of each transistor ‘floats’ (i.e. is not explicitly electrically connected to an external terminal) and, hence, the embodiments described above have not addressed body connections. In bulk complementary metal-oxide semiconductors (CMOS) and, occasionally in SOI, body contacts are available for FETs. In this case, the bodies may continue to be left to ‘float’ or, the bodies may be explicitly connected in a number of ways. One such connection is illustrated in
FIG. 3 with dashedlines connecting bodies sources 144. Alternatively,bodies - The foregoing description of various aspects of the invention has been presented for purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise form disclosed, and obviously, many modifications and variations are possible. Such modifications and variations that may be apparent to a person skilled in the art are intended to be included within the scope of the invention as defined by the accompanying claims.
Claims (30)
1. A structure comprising:
a plurality of electrical structures arranged in a non-collinear fashion for determining a magnitude and direction of a process environment variation in a vicinity of the plurality of electrical structures.
2. The structure of claim 1 , wherein the plurality of electrical structures includes one of a plurality of resistors, a plurality of diodes, a plurality of ring oscillators and a plurality of transistors.
3. The structure of claim 1 , wherein each of the plurality of electrical structures includes:
a first polarity field effect transistor (FET) and a second polarity FET, and
wherein gates and drains of the first polarity FET and the second polarity FET are coupled to a first pad and sources of the first polarity FET and the second polarity FET are coupled to a second pad.
4. The structure of claim 3 , wherein each of the plurality of structures measures a threshold voltage.
5. The structure of claim 1 , wherein each of the plurality of electrical structures includes:
a first polarity field effect transistor (FET) and a second polarity FET, and
wherein a source of the first polarity FET is coupled to a first pad, a gate and a drain of the first polarity FET are coupled to a source of the second polarity FET, and a gate and a drain of the second polarity FET are coupled to a second pad.
6. The structure of claim 5 , wherein a body of the first polarity FET is coupled to the source of the first polarity FET and a body of the second polarity FET is coupled to the source of the second polarity FET.
7. The structure of claim 5 , wherein each of the plurality of structures measures an off current (Ioff).
8. The structure of claim 1 , wherein the process environment variation includes one of: a spacer etch variation, a photolithography exposure variation, a gate length variation, a variation in film deposition, and an anneal temperature gradient.
9. The structure of claim 1 , wherein the non-collinear fashion includes a substantially triangulated fashion.
10. The structure of claim 1 , wherein the plurality of electrical structures are substantially identical.
11. A structure comprising:
a first polarity field effect transistor (FET) coupled to a second polarity FET, each of the first polarity FET and the second polarity FET coupled to a first pad and a second pad; and
wherein the structure provides for independent measurement of the first polarity FET and the second polarity FET using only the first pad and the second pad.
12. The structure of claim 11 , wherein gates and drains of the first polarity FET and the second polarity FET are coupled to the first pad and sources of the first polarity FET and second polarity FET are coupled to the second pad.
13. The structure of claim 11 , wherein a source of the first polarity FET is coupled to a first pad, a gate and a drain of the first polarity FET are coupled to a source of the second polarity FET, and a gate and a drain of the second polarity FET are coupled to the second pad.
14. The structure of claim 13 , wherein a body of the first polarity FET is coupled to the source of the first polarity FET and a body of the second polarity FET is coupled to the source of the second polarity FET.
15. A method of determining a gradient field of a process environment variation, the method comprising:
providing a plurality of electrical structures arranged in a non-collinear fashion in a substrate;
performing a process on the substrate;
measuring an electrical property of each of the electrical structures; and
determining a magnitude and a direction of the process environment variation in the vicinity of the plurality of electrical structures based on the measurements.
16. The method of claim 15 , wherein the plurality of electrical structures includes one of a plurality of resistors, a plurality of diodes, a plurality of ring oscillators and a plurality of transistors.
17. The method of claim 15 , wherein the providing includes providing each of the plurality of electrical structures as:
a first polarity field effect transistor (FET) and a second polarity FET,
wherein gates and drains of the first polarity FET and the second polarity FET are coupled to a first pad and sources of the first polarity FET and the second polarity FET are coupled to a second pad.
18. The method of claim 17 , wherein the electrical property includes a threshold voltage.
19. The method of claim 15 , wherein the providing includes providing each of the plurality of electrical structures as:
a first polarity field effect transistor (FET) and a second polarity FET,
wherein a source of the first polarity FET is coupled to a first pad, a gate and a drain of the first polarity FET are coupled to a source of the second polarity FET, and a gate and a drain of the second polarity FET are coupled to a second pad.
20. The method of claim 19 , wherein the electrical property includes an off current (Ioff).
21. The method of claim 15 , wherein the process environment variation includes one of: a spacer etch variation, a photolithography exposure variation, a gate length variation, a variation in film deposition, and an anneal temperature gradient.
22. The method of claim 15 , wherein the providing includes providing the plurality of electrical structures in a substantially triangulated fashion.
23. The method of claim 15 , wherein the providing includes providing the plurality of electrical structures interconnected to a plurality of pads.
24. A method of independently evaluating transistors, the method comprising:
forming a first polarity field effect transistor (FET) coupled to a second polarity FET, each of the first polarity FET and the second polarity FET coupled to a first pad and a second pad; and
independently measuring the first polarity FET and the second polarity FET using only the first pad and the second pad.
25. The method of claim 24 , wherein the forming includes forming gates and drains of the first polarity FET and the second polarity FET are coupled to the first pad and sources of the first polarity FET and second polarity FET are coupled to the second pad.
26. The method of claim 25 , wherein the measuring includes measuring a threshold voltage.
27. The method of claim 24 , wherein the forming includes coupling a source of the first polarity FET to a first pad, a gate and a drain of the first polarity FET to a source of the second polarity FET, and a gate and a drain of the second polarity FET to the second pad.
28. The method of claim 27 , wherein the forming further includes coupling a body of the first polarity FET to the source of the first polarity FET and a body of the second polarity FET to the source of the second polarity FET.
29. The method of claim 27 , wherein the measuring includes measuring an off-current (Ioff).
30. The method of claim 24 , wherein the measuring includes at least one of:
applying a positive voltage ramp to the first pad with respect to the second pad to maintain the first polarity FET in an off-state and measuring the second polarity FET; and
applying a negative voltage ramp to the first pad with respect to the second pad to maintain the second polarity FET in an off-state and measuring the first polarity FET.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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US11/382,722 US20070263472A1 (en) | 2006-05-11 | 2006-05-11 | Process environment variation evaluation |
CN200710089833.XA CN101071813B (en) | 2006-05-11 | 2007-04-05 | Structure and method for determining gradient field of process environment |
US12/870,373 US8932884B2 (en) | 2006-05-11 | 2010-08-27 | Process environment variation evaluation |
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US11/382,722 US20070263472A1 (en) | 2006-05-11 | 2006-05-11 | Process environment variation evaluation |
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US12/870,373 Division US8932884B2 (en) | 2006-05-11 | 2010-08-27 | Process environment variation evaluation |
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US7487487B1 (en) | 2008-04-01 | 2009-02-03 | International Business Machines Corporation | Design structure for monitoring cross chip delay variation on a semiconductor device |
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US8754412B2 (en) | 2012-01-03 | 2014-06-17 | International Business Machines Corporation | Intra die variation monitor using through-silicon via |
US8966431B2 (en) | 2012-11-21 | 2015-02-24 | International Business Machines Corporation | Semiconductor timing improvement |
US9508618B2 (en) * | 2014-04-11 | 2016-11-29 | Globalfoundries Inc. | Staggered electrical frame structures for frame area reduction |
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Also Published As
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US8932884B2 (en) | 2015-01-13 |
US20100323462A1 (en) | 2010-12-23 |
CN101071813B (en) | 2011-01-19 |
CN101071813A (en) | 2007-11-14 |
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