DE60121588D1 - Neue photoinitiatoren - Google Patents

Neue photoinitiatoren

Info

Publication number
DE60121588D1
DE60121588D1 DE60121588T DE60121588T DE60121588D1 DE 60121588 D1 DE60121588 D1 DE 60121588D1 DE 60121588 T DE60121588 T DE 60121588T DE 60121588 T DE60121588 T DE 60121588T DE 60121588 D1 DE60121588 D1 DE 60121588D1
Authority
DE
Germany
Prior art keywords
methods
present
photoinitiators
directed
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60121588T
Other languages
English (en)
Other versions
DE60121588T2 (de
Inventor
Sinclair Nohr
Gavin Macdonald
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimberly Clark Worldwide Inc
Kimberly Clark Corp
Original Assignee
Kimberly Clark Worldwide Inc
Kimberly Clark Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimberly Clark Worldwide Inc, Kimberly Clark Corp filed Critical Kimberly Clark Worldwide Inc
Publication of DE60121588D1 publication Critical patent/DE60121588D1/de
Application granted granted Critical
Publication of DE60121588T2 publication Critical patent/DE60121588T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
DE60121588T 2000-06-19 2001-06-19 Neue photoinitiatoren Expired - Lifetime DE60121588T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21242800P 2000-06-19 2000-06-19
US212428P 2000-06-19
PCT/US2001/019525 WO2002000735A1 (en) 2000-06-19 2001-06-19 Novel photoinitiators and applications therefor

Publications (2)

Publication Number Publication Date
DE60121588D1 true DE60121588D1 (de) 2006-08-31
DE60121588T2 DE60121588T2 (de) 2006-11-16

Family

ID=22790958

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60121588T Expired - Lifetime DE60121588T2 (de) 2000-06-19 2001-06-19 Neue photoinitiatoren

Country Status (10)

Country Link
US (1) US6486227B2 (de)
EP (1) EP1297022B1 (de)
JP (1) JP2004501987A (de)
KR (1) KR100772772B1 (de)
AT (1) ATE333471T1 (de)
AU (1) AU2001269905A1 (de)
CA (1) CA2412607C (de)
DE (1) DE60121588T2 (de)
MX (1) MXPA02012011A (de)
WO (1) WO2002000735A1 (de)

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US7666410B2 (en) 2002-12-20 2010-02-23 Kimberly-Clark Worldwide, Inc. Delivery system for functional compounds
US8409618B2 (en) 2002-12-20 2013-04-02 Kimberly-Clark Worldwide, Inc. Odor-reducing quinone compounds
EP1572467B1 (de) * 2002-12-20 2019-10-23 Inca Digital Printers Limited Aushärtung
US6780896B2 (en) 2002-12-20 2004-08-24 Kimberly-Clark Worldwide, Inc. Stabilized photoinitiators and applications thereof
US7262229B2 (en) * 2004-05-03 2007-08-28 Flint Group Ink for excimer curing
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US7763061B2 (en) 2004-12-23 2010-07-27 Kimberly-Clark Worldwide, Inc. Thermal coverings
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KR101297917B1 (ko) 2005-08-30 2013-08-27 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 대안적인 불화 붕소 전구체를 이용한 붕소 이온 주입 방법,및 주입을 위한 대형 수소화붕소의 형성 방법
US7935538B2 (en) 2006-12-15 2011-05-03 Kimberly-Clark Worldwide, Inc. Indicator immobilization on assay devices
US7785496B1 (en) 2007-01-26 2010-08-31 Clemson University Research Foundation Electrochromic inks including conducting polymer colloidal nanocomposites, devices including the electrochromic inks and methods of forming same
US8052829B2 (en) * 2007-10-26 2011-11-08 Dymax Corporation Photopolymerizable compositions containing an oxonol dye
US20090157024A1 (en) * 2007-12-14 2009-06-18 Kimberly-Clark Worldwide, Inc. Hydration Test Devices
US8134042B2 (en) 2007-12-14 2012-03-13 Kimberly-Clark Worldwide, Inc. Wetness sensors
US8222476B2 (en) 2008-10-31 2012-07-17 Kimberly-Clark Worldwide, Inc. Absorbent articles with impending leakage sensors
US20110021011A1 (en) 2009-07-23 2011-01-27 Advanced Technology Materials, Inc. Carbon materials for carbon implantation
US8138071B2 (en) * 2009-10-27 2012-03-20 Advanced Technology Materials, Inc. Isotopically-enriched boron-containing compounds, and methods of making and using same
US8598022B2 (en) 2009-10-27 2013-12-03 Advanced Technology Materials, Inc. Isotopically-enriched boron-containing compounds, and methods of making and using same
US8062965B2 (en) * 2009-10-27 2011-11-22 Advanced Technology Materials, Inc. Isotopically-enriched boron-containing compounds, and methods of making and using same
US8779383B2 (en) 2010-02-26 2014-07-15 Advanced Technology Materials, Inc. Enriched silicon precursor compositions and apparatus and processes for utilizing same
TWI585042B (zh) 2010-02-26 2017-06-01 恩特葛瑞斯股份有限公司 用以增進離子植入系統中之離子源的壽命及性能之方法與設備
US8623292B2 (en) 2010-08-17 2014-01-07 Kimberly-Clark Worldwide, Inc. Dehydration sensors with ion-responsive and charged polymeric surfactants
CN106237934B (zh) 2010-08-30 2019-08-27 恩特格里斯公司 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法
TWI583442B (zh) 2011-10-10 2017-05-21 恩特葛瑞斯股份有限公司 Ｂ２ｆ４之製造程序
WO2013122986A1 (en) 2012-02-14 2013-08-22 Advanced Technology Materials, Inc. Carbon dopant gas and co-flow for implant beam and source life performance improvement
SG10201801299YA (en) 2013-08-16 2018-03-28 Entegris Inc Silicon implantation in substrates and provision of silicon precursor compositions therefor
KR102587532B1 (ko) 2015-02-27 2023-10-11 킴벌리-클라크 월드와이드, 인크. 흡수 용품 누설 평가 시스템
MX2019010970A (es) 2017-04-05 2019-12-16 Kimberly Clark Co Prenda para detectar fugas en un articulo absorbente y metodos para detectar fugas del articulo absorbente usando la misma.

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EP1297022A1 (de) 2003-04-02
CA2412607C (en) 2010-12-21
WO2002000735A1 (en) 2002-01-03
KR100772772B1 (ko) 2007-11-01
ATE333471T1 (de) 2006-08-15
US6486227B2 (en) 2002-11-26
US20020099111A1 (en) 2002-07-25
DE60121588T2 (de) 2006-11-16
JP2004501987A (ja) 2004-01-22
CA2412607A1 (en) 2002-01-03
KR20030011359A (ko) 2003-02-07
EP1297022B1 (de) 2006-07-19
MXPA02012011A (es) 2003-04-22
AU2001269905A1 (en) 2002-01-08

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