CA1295774C - Auto-photocrosslinkable copolyimides and polyimide compositions - Google Patents

Auto-photocrosslinkable copolyimides and polyimide compositions

Info

Publication number
CA1295774C
CA1295774C CA000585713A CA585713A CA1295774C CA 1295774 C CA1295774 C CA 1295774C CA 000585713 A CA000585713 A CA 000585713A CA 585713 A CA585713 A CA 585713A CA 1295774 C CA1295774 C CA 1295774C
Authority
CA
Canada
Prior art keywords
radicals
formula
mol
radical
ortho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CA000585713A
Other languages
English (en)
French (fr)
Inventor
Stanley Jay Jasne
Ottmar Rohde
Josef Pfeifer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of CA1295774C publication Critical patent/CA1295774C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387Polyamides or polyimides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1085Polyimides with diamino moieties or tetracarboxylic segments containing heterocyclic moieties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
CA000585713A 1987-12-15 1988-12-13 Auto-photocrosslinkable copolyimides and polyimide compositions Expired - Lifetime CA1295774C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13340787A 1987-12-15 1987-12-15
US133,407 1987-12-15

Publications (1)

Publication Number Publication Date
CA1295774C true CA1295774C (en) 1992-02-11

Family

ID=22458474

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000585713A Expired - Lifetime CA1295774C (en) 1987-12-15 1988-12-13 Auto-photocrosslinkable copolyimides and polyimide compositions

Country Status (4)

Country Link
EP (1) EP0321398B1 (enCached4)
JP (1) JP2732101B2 (enCached4)
CA (1) CA1295774C (enCached4)
DE (1) DE3851134D1 (enCached4)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5427862A (en) * 1990-05-08 1995-06-27 Amoco Corporation Photocurable polyimide coated glass fiber
CA2040994A1 (en) * 1990-05-08 1991-11-09 David D. Ngo Photoimageable polyimide coating
US5807498A (en) * 1996-03-29 1998-09-15 Alliant Techsystems Inc. Process and materials for aligning liquid crystals and liquid crystal optical elements
US6342333B1 (en) * 1999-09-23 2002-01-29 Hitachi Chemical Dupont Microsystems, L.L.C. Photosensitive resin composition, patterning method, and electronic components
JPWO2022270541A1 (enCached4) * 2021-06-25 2022-12-29

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4698295A (en) * 1984-11-16 1987-10-06 Ciba-Geigy Corporation Polyimides, a process for their preparation and their use, and tetracarboxylic acids and tetracarboxylic acid derivatives
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
US4847359A (en) * 1986-06-30 1989-07-11 Ciba-Geigy Corporation Diamino-9,10-dihydroanthracenes and polyamide acid (esters) and polyimides derived therefrom
EP0252883B1 (de) * 1986-07-08 1991-01-16 Ciba-Geigy Ag Beschichtetes Material enthaltend eine strahlungsempfindliche Polyimidschicht mit speziellen Diaminodiphenylmethaneinheiten

Also Published As

Publication number Publication date
EP0321398B1 (de) 1994-08-17
EP0321398A2 (de) 1989-06-21
EP0321398A3 (en) 1990-07-25
JPH01201334A (ja) 1989-08-14
JP2732101B2 (ja) 1998-03-25
DE3851134D1 (de) 1994-09-22

Similar Documents

Publication Publication Date Title
CA1256759A (en) Coated material and its use
US5539080A (en) Polyimide and a semiconductor prepared therefrom
CA1248278A (en) Radiation-sensitive coating agent
KR920000208B1 (ko) 폴리이미드의 제조방법
US4785074A (en) Radiation-sensitive polycondensates, processes for their preparation, coated material and its use
JP3024008B2 (ja) 光画像形成性ポリイミドコーティング
US4925912A (en) Auto-photocrosslinkable copolyimides and polyimide compositions
US4830953A (en) Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating
US4587197A (en) Flexible photosensitive polymer composition with azide and/or amine compound, poly(amic acid) and highly polar compound with boiling point above 150° C.
CA1244579A (en) Radiation-sensitive coating agent and its use
CA1295774C (en) Auto-photocrosslinkable copolyimides and polyimide compositions
Ho et al. Synthesis and characteristics of organic soluble photoactive polyimides
JPH0539281A (ja) ジ置換芳香族二無水物及びそれから製造されたポリイミド
JPS61236829A (ja) 塗装された材料及びその利用方法
CA1281146C (en) Photostructurable polyimide mixtures
US5153303A (en) Polyimides prepared from disubstituted aromatic tetracarboxylic acid dianhydrides
KR101749874B1 (ko) 감광성 수지 조성물, 그의 릴리프 패턴막, 릴리프 패턴막의 제조 방법, 릴리프 패턴막을 포함하는 전자 부품 또는 광학 제품, 및 감광성 수지 조성물을 포함하는 접착제
US5102959A (en) Auto-photocrosslinkable copolyimides and polyimide compositions
US5176982A (en) Photosensitive resin composition for forming a polyimide film pattern
JP3324200B2 (ja) 感光性樹脂組成物
JP5053650B2 (ja) ポリイミド共重合体、ポジ型感光性樹脂組成物、およびパターン形成方法
JP3461931B2 (ja) 耐熱性感光性重合体組成物及びレリーフパターンの製造法
JPS6347142A (ja) 特定のジアミノジフエニルメタン単位を有する感放射線性ポリイミド層を含有する被覆物
JPH05310933A (ja) 溶媒可溶性ポリイミドの製造方法
KR860000070B1 (ko) 광 또는 방사선 감응성 중합체조성물

Legal Events

Date Code Title Description
MKLA Lapsed